2000
|
Nanoimprint and micro-contact printing tri-layer processes Article de journal Y Chen; A Lebib; S Li; A Pépin; D Peyrade; M Natali; E Cambril The European Physical Journal Applied Physics, 12 (3), p. 223–229, 2000. @article{chen2000nanoimprint,
title = {Nanoimprint and micro-contact printing tri-layer processes},
author = {Y Chen and A Lebib and S Li and A P\'{e}pin and D Peyrade and M Natali and E Cambril},
year = {2000},
date = {2000-01-01},
journal = {The European Physical Journal Applied Physics},
volume = {12},
number = {3},
pages = {223--229},
publisher = {EDP Sciences},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Submicrometer resolution Yablonovite templates fabricated by x-ray lithography Article de journal C Cuisin; A Chelnokov; J-M Lourtioz; D Decanini; Y Chen Applied Physics Letters, 77 (6), p. 770–772, 2000. @article{cuisin2000submicrometer,
title = {Submicrometer resolution Yablonovite templates fabricated by x-ray lithography},
author = {C Cuisin and A Chelnokov and J-M Lourtioz and D Decanini and Y Chen},
year = {2000},
date = {2000-01-01},
journal = {Applied Physics Letters},
volume = {77},
number = {6},
pages = {770--772},
publisher = {American Institute of Physics},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Tri-layer systems for nanoimprint lithography with an improved process latitude Article de journal A Lebib; Y Chen; F Carcenac; E Cambril; L Manin; L Couraud; H Launois Microelectronic engineering, 53 (1-4), p. 175–178, 2000. @article{lebib2000tri,
title = {Tri-layer systems for nanoimprint lithography with an improved process latitude},
author = {A Lebib and Y Chen and F Carcenac and E Cambril and L Manin and L Couraud and H Launois},
year = {2000},
date = {2000-01-01},
journal = {Microelectronic engineering},
volume = {53},
number = {1-4},
pages = {175--178},
publisher = {Elsevier},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Zone-plate-array lithography using synchrotron radiation Article de journal A Pépin; D Decanini; Y Chen Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 18 (6), p. 2981–2985, 2000. @article{pepin2000zone,
title = {Zone-plate-array lithography using synchrotron radiation},
author = {A P\'{e}pin and D Decanini and Y Chen},
year = {2000},
date = {2000-01-01},
journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {18},
number = {6},
pages = {2981--2985},
publisher = {American Vacuum Society},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
1999
|
Devices and Fabrication-Patterning of planar magnetic nanostructures Article de journal T Devolder; C Chappert; Y Chen; E Cambril; H Launois; H Bernas; J Ferre; JP Jamet Journal of Vacuum Science and Technology-Section B, 17 (6), p. 3177–3181, 1999. @article{devolder1999devices,
title = {Devices and Fabrication-Patterning of planar magnetic nanostructures},
author = {T Devolder and C Chappert and Y Chen and E Cambril and H Launois and H Bernas and J Ferre and JP Jamet},
year = {1999},
date = {1999-01-01},
journal = {Journal of Vacuum Science and Technology-Section B},
volume = {17},
number = {6},
pages = {3177--3181},
publisher = {Woodbury, NY: Published for the Society by the American Institute of Physics~…},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Fabrication of three-dimensional microstructures by high resolution x-ray lithography Article de journal C Cuisin; Y Chen; D Decanini; A Chelnokov; F Carcenac; A Madouri; JM Lourtioz; H Launois Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 17 (6), p. 3444–3448, 1999. @article{cuisin1999fabrication,
title = {Fabrication of three-dimensional microstructures by high resolution x-ray lithography},
author = {C Cuisin and Y Chen and D Decanini and A Chelnokov and F Carcenac and A Madouri and JM Lourtioz and H Launois},
year = {1999},
date = {1999-01-01},
journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {17},
number = {6},
pages = {3444--3448},
publisher = {American Vacuum Society},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Ion beam induced magnetic nanostructure patterning Article de journal H Bernas; T Devolder; C Chappert; J Ferré; V Kottler; Y Chen; Christophe Vieu; JP Jamet; V Mathet; E Cambril; others Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 148 (1-4), p. 872–879, 1999. @article{bernas1999ion,
title = {Ion beam induced magnetic nanostructure patterning},
author = {H Bernas and T Devolder and C Chappert and J Ferr\'{e} and V Kottler and Y Chen and Christophe Vieu and JP Jamet and V Mathet and E Cambril and others},
year = {1999},
date = {1999-01-01},
journal = {Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms},
volume = {148},
number = {1-4},
pages = {872--879},
publisher = {North-Holland},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Magneto-optical contrast in near-field optics Article de journal Y Chen; V Kottler; C Chappert; N Essaidi Journal of microscopy, 194 (2-3), p. 495–499, 1999. @article{chen1999magneto,
title = {Magneto-optical contrast in near-field optics},
author = {Y Chen and V Kottler and C Chappert and N Essaidi},
year = {1999},
date = {1999-01-01},
journal = {Journal of microscopy},
volume = {194},
number = {2-3},
pages = {495--499},
publisher = {Blackwell Science Ltd Oxford, UK and Cambridge, USA},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Mold-assisted near-field optical lithography Article de journal Y Chen; F Carcenac; C Ecoffet; DJ Lougnot; H Launois Microelectronic engineering, 46 (1-4), p. 69–72, 1999. @article{chen1999mold,
title = {Mold-assisted near-field optical lithography},
author = {Y Chen and F Carcenac and C Ecoffet and DJ Lougnot and H Launois},
year = {1999},
date = {1999-01-01},
journal = {Microelectronic engineering},
volume = {46},
number = {1-4},
pages = {69--72},
publisher = {Elsevier},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Nanoimprint lithography for a large area pattern replication Article de journal A Lebib; Y Chen; J Bourneix; F Carcenac; E Cambril; L Couraud; H Launois Microelectronic engineering, 46 (1-4), p. 319–322, 1999. @article{lebib1999nanoimprint,
title = {Nanoimprint lithography for a large area pattern replication},
author = {A Lebib and Y Chen and J Bourneix and F Carcenac and E Cambril and L Couraud and H Launois},
year = {1999},
date = {1999-01-01},
journal = {Microelectronic engineering},
volume = {46},
number = {1-4},
pages = {319--322},
publisher = {Elsevier},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Patterning of planar magnetic nanostructures by ion irradiation Article de journal T Devolder; C Chappert; Y Chen; E Cambril; H Launois; HHFH Bernas; J Ferre; JP Jamet Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 17 (6), p. 3177–3181, 1999. @article{devolder1999patterning,
title = {Patterning of planar magnetic nanostructures by ion irradiation},
author = {T Devolder and C Chappert and Y Chen and E Cambril and H Launois and HHFH Bernas and J Ferre and JP Jamet},
year = {1999},
date = {1999-01-01},
journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {17},
number = {6},
pages = {3177--3181},
publisher = {American Vacuum Society},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Sub-50 nm planar magnetic nanostructures fabricated by ion irradiation Article de journal T Devolder; C Chappert; Y Chen; E Cambril; HPJJ Bernas; JP Jamet; J Ferré Applied physics letters, 74 (22), p. 3383–3385, 1999. @article{devolder1999sub,
title = {Sub-50 nm planar magnetic nanostructures fabricated by ion irradiation},
author = {T Devolder and C Chappert and Y Chen and E Cambril and HPJJ Bernas and JP Jamet and J Ferr\'{e}},
year = {1999},
date = {1999-01-01},
journal = {Applied physics letters},
volume = {74},
number = {22},
pages = {3383--3385},
publisher = {American Institute of Physics},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Versatile patterning process for semiconductors based on microcontact printing Article de journal G Schmidt; M Tormen; G Muller; LW Molenkamp; Y Chen; A Lebib; H Launois Electronics Letters, 35 (20), p. 1731–1733, 1999. @article{schmidt1999versatile,
title = {Versatile patterning process for semiconductors based on microcontact printing},
author = {G Schmidt and M Tormen and G Muller and LW Molenkamp and Y Chen and A Lebib and H Launois},
year = {1999},
date = {1999-01-01},
journal = {Electronics Letters},
volume = {35},
number = {20},
pages = {1731--1733},
publisher = {IET},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
1998
|
Absorber edge effect in proximity X-ray lithography Article de journal G Simon; Y Chen; AM Haghiri-Gosnet; D Decanini; J Bourneix; F Rousseaux; H Launois Microelectronic engineering, 41 , p. 297–300, 1998. @article{simon1998absorber,
title = {Absorber edge effect in proximity X-ray lithography},
author = {G Simon and Y Chen and AM Haghiri-Gosnet and D Decanini and J Bourneix and F Rousseaux and H Launois},
year = {1998},
date = {1998-01-01},
journal = {Microelectronic engineering},
volume = {41},
pages = {297--300},
publisher = {Elsevier},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Edge diffraction enhanced printability in x-ray nanolithography Article de journal Y Chen; G Simon; AM Haghiri-Gosnet; F Carcenac; D Decanini; F Rousseaux; H Launois Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 16 (6), p. 3521–3525, 1998. @article{chen1998edge,
title = {Edge diffraction enhanced printability in x-ray nanolithography},
author = {Y Chen and G Simon and AM Haghiri-Gosnet and F Carcenac and D Decanini and F Rousseaux and H Launois},
year = {1998},
date = {1998-01-01},
journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {16},
number = {6},
pages = {3521--3525},
publisher = {American Vacuum Society},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Fabrication and characterization of optical-fiber nanoprobes for scanning near-field optical microscopy Article de journal N Essaidi; Y Chen; V Kottler; E Cambril; C Mayeux; N Ronarch; C Vieu Applied optics, 37 (4), p. 609–615, 1998. @article{essaidi1998fabrication,
title = {Fabrication and characterization of optical-fiber nanoprobes for scanning near-field optical microscopy},
author = {N Essaidi and Y Chen and V Kottler and E Cambril and C Mayeux and N Ronarch and C Vieu},
year = {1998},
date = {1998-01-01},
journal = {Applied optics},
volume = {37},
number = {4},
pages = {609--615},
publisher = {Optical Society of America},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Fabrication of magnetic submicron-wire channels for the investigation of magnetization reversal Article de journal Y Chen; V Kottler; F Carcenac; JF René; N Essaidi; C Chappert; H Launois Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 16 (6), p. 3830–3834, 1998. @article{chen1998fabrication,
title = {Fabrication of magnetic submicron-wire channels for the investigation of magnetization reversal},
author = {Y Chen and V Kottler and F Carcenac and JF Ren\'{e} and N Essaidi and C Chappert and H Launois},
year = {1998},
date = {1998-01-01},
journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {16},
number = {6},
pages = {3830--3834},
publisher = {American Vacuum Society},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
High resolution x-ray Lithography and Electron-beam Lithography: limits and perspectives Article de journal Y Chen; C Vieu; H Launois Condensed Matter News, 6 (3), p. 22–30, 1998. @article{chen1998high,
title = {High resolution x-ray Lithography and Electron-beam Lithography: limits and perspectives},
author = {Y Chen and C Vieu and H Launois},
year = {1998},
date = {1998-01-01},
journal = {Condensed Matter News},
volume = {6},
number = {3},
pages = {22--30},
publisher = {Philadelphia: Gordon and Breach Science Publishers, 1991-c2000.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Magnetization reversal in (CoNi/Pt)/sub 6/dots connected to a large area through submicron wide channels Article de journal F Fournel; Y Chen; F Carcenac; N Essaidi; H Launois; V Kottler; C Chappert IEEE transactions on magnetics, 34 (4), p. 1027–1029, 1998. @article{fournel1998magnetizationb,
title = {Magnetization reversal in (CoNi/Pt)/sub 6/dots connected to a large area through submicron wide channels},
author = {F Fournel and Y Chen and F Carcenac and N Essaidi and H Launois and V Kottler and C Chappert},
year = {1998},
date = {1998-01-01},
journal = {IEEE transactions on magnetics},
volume = {34},
number = {4},
pages = {1027--1029},
publisher = {IEEE},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Planar patterned magnetic media obtained by ion irradiation Article de journal C Chappert; H Bernas; J Ferré; V Kottler; J-P Jamet; Y Chen; E Cambril; T Devolder; F Rousseaux; V Mathet; others Science, 280 (5371), p. 1919–1922, 1998. @article{chappert1998planar,
title = {Planar patterned magnetic media obtained by ion irradiation},
author = {C Chappert and H Bernas and J Ferr\'{e} and V Kottler and J-P Jamet and Y Chen and E Cambril and T Devolder and F Rousseaux and V Mathet and others},
year = {1998},
date = {1998-01-01},
journal = {Science},
volume = {280},
number = {5371},
pages = {1919--1922},
publisher = {American Association for the Advancement of Science},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Very low contrast X-ray masks for high resolution printing Article de journal Y Chen; G Simon; AM Haghiri-Gosnet; L Manin; H Launois Microelectronic engineering, 41 , p. 275–278, 1998. @article{chen1998very,
title = {Very low contrast X-ray masks for high resolution printing},
author = {Y Chen and G Simon and AM Haghiri-Gosnet and L Manin and H Launois},
year = {1998},
date = {1998-01-01},
journal = {Microelectronic engineering},
volume = {41},
pages = {275--278},
publisher = {Elsevier},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
1997
|
Dichroic imaging of magnetic domains with a scanning near-field optical microscope Article de journal V Kottler; N Essaidi; N Ronarch; C Chappert; Y Chen Journal of magnetism and magnetic materials, 165 (1-3), p. 398–400, 1997. @article{kottler1997dichroic,
title = {Dichroic imaging of magnetic domains with a scanning near-field optical microscope},
author = {V Kottler and N Essaidi and N Ronarch and C Chappert and Y Chen},
year = {1997},
date = {1997-01-01},
journal = {Journal of magnetism and magnetic materials},
volume = {165},
number = {1-3},
pages = {398--400},
publisher = {North-Holland},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Fabrication of two-dimensional photonic lattices in GaAs: the regular graphite structures Article de journal Y Chen; G Faini; H Launois; J Etrillard Superlattices and Microstructures, 22 (1), p. 109–113, 1997. @article{chen1997fabrication,
title = {Fabrication of two-dimensional photonic lattices in GaAs: the regular graphite structures},
author = {Y Chen and G Faini and H Launois and J Etrillard},
year = {1997},
date = {1997-01-01},
journal = {Superlattices and Microstructures},
volume = {22},
number = {1},
pages = {109--113},
publisher = {Academic Press},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
High resolution x-ray lithography: Features of two-dimensional patterning Article de journal Y Chen; F Carcenac; F Rousseaux; Haghiri AM; H Launois Journal of Photopolymer Science and Technology, 10 (4), p. 619–623, 1997. @article{chen1997high,
title = {High resolution x-ray lithography: Features of two-dimensional patterning},
author = {Y Chen and F Carcenac and F Rousseaux and Haghiri AM and H Launois},
year = {1997},
date = {1997-01-01},
journal = {Journal of Photopolymer Science and Technology},
volume = {10},
number = {4},
pages = {619--623},
publisher = {The Society of Photopolymer Science and Technology (SPST)},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Photonic band gaps of two-dimensional photonic lattices: the face-centered graphite structures Article de journal Y Chen Superlattices and microstructures, 22 (1), p. 115–120, 1997. @article{chen1997photonic,
title = {Photonic band gaps of two-dimensional photonic lattices: the face-centered graphite structures},
author = {Y Chen},
year = {1997},
date = {1997-01-01},
journal = {Superlattices and microstructures},
volume = {22},
number = {1},
pages = {115--120},
publisher = {Academic Press},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Sub-20 nm x-ray nanolithography using conventional mask technologies on monochromatized synchrotron radiation Article de journal G Simon; AM Haghiri-Gosnet; J Bourneix; D Decanini; Y Chen; F Rousseaux; H Launois; B Vidal Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 15 (6), p. 2489–2494, 1997. @article{simon1997sub,
title = {Sub-20 nm x-ray nanolithography using conventional mask technologies on monochromatized synchrotron radiation},
author = {G Simon and AM Haghiri-Gosnet and J Bourneix and D Decanini and Y Chen and F Rousseaux and H Launois and B Vidal},
year = {1997},
date = {1997-01-01},
journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {15},
number = {6},
pages = {2489--2494},
publisher = {American Vacuum Society},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
1996
|
Proximity X-ray lithography as a quick replication technique in nanofabrication: recent progress and perspectives Article de journal Y Chen; F Rousseaux; AM Haghiri-Gosnet; RK Kupka; MF Ravet; G Simon; H Launois Microelectronic engineering, 30 (1-4), p. 191–194, 1996. @article{chen1996proximity,
title = {Proximity X-ray lithography as a quick replication technique in nanofabrication: recent progress and perspectives},
author = {Y Chen and F Rousseaux and AM Haghiri-Gosnet and RK Kupka and MF Ravet and G Simon and H Launois},
year = {1996},
date = {1996-01-01},
journal = {Microelectronic engineering},
volume = {30},
number = {1-4},
pages = {191--194},
publisher = {Elsevier},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
1995
|
Bulk exciton polaritons in GaAs microcavities Article de journal Y Chen; A Tredicucci; F Bassani Physical Review B, 52 (3), p. 1800, 1995. @article{chen1995bulk,
title = {Bulk exciton polaritons in GaAs microcavities},
author = {Y Chen and A Tredicucci and F Bassani},
year = {1995},
date = {1995-01-01},
journal = {Physical Review B},
volume = {52},
number = {3},
pages = {1800},
publisher = {APS},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Design and implementation of a combined scanning tunneling and near-field optical microscope Article de journal Y Chen; M Garcia-Parajo; Y Lagadec; N Essaidi; L Kadoche; M Borger; H Launois Ultramicroscopy, 61 (1-4), p. 253–258, 1995. @article{chen1995design,
title = {Design and implementation of a combined scanning tunneling and near-field optical microscope},
author = {Y Chen and M Garcia-Parajo and Y Lagadec and N Essaidi and L Kadoche and M Borger and H Launois},
year = {1995},
date = {1995-01-01},
journal = {Ultramicroscopy},
volume = {61},
number = {1-4},
pages = {253--258},
publisher = {North-Holland},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
Evaluation of a diamond-based x-ray mask for high resolution x-ray proximity lithography Article de journal MF Ravet; F Rousseaux; Y Chen; AM Haghiri-Gosnet; F Carcenac; D Decanini; J Bourneix; H Launois; PK Bachmann; H Lade; others Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 13 (6), p. 3055–3060, 1995. @article{ravet1995evaluation,
title = {Evaluation of a diamond-based x-ray mask for high resolution x-ray proximity lithography},
author = {MF Ravet and F Rousseaux and Y Chen and AM Haghiri-Gosnet and F Carcenac and D Decanini and J Bourneix and H Launois and PK Bachmann and H Lade and others},
year = {1995},
date = {1995-01-01},
journal = {Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {13},
number = {6},
pages = {3055--3060},
publisher = {American Vacuum Society},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
|
