Fabrication of nano-scaled patterns on ceramic thin films and silicon substrates by soft ultraviolet nanoimprint lithography

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TitleFabrication of nano-scaled patterns on ceramic thin films and silicon substrates by soft ultraviolet nanoimprint lithography
Publication TypeJournal Article
Year of Publication2010
AuthorsJim, KL, Lee FK, Xin JZ, Leung CW, Chan HLW, Chen Y
JournalMicroelectronic Engineering
Volume87
Pagination959-962
Abstract

Soft ultraviolet nanoimprint lithography is a cost-effective and versatile technique for the transfer of nano-scaled patterns to various surfaces. Here, we report on the fabrication of sub-micron square pillar arrays in epitaxial Ba0.7Sr0.3TiO3 ceramic films, using a combination of nanoimprint lithography and inductively coupled plasma etching techniques. Based on a similar approach we have also succeeded in preparing positive (direct) and negative (inverse) replicas of silicon master molds. Such a generic process could find application in various materials. (C) 2009 Elsevier B.V. All rights reserved.

Unit: 
UMR 8640